Explicit modelling of SOA formation from pinene photooxidation: Sensitivity to vapour pressure estimation

Valorso, R., and Coauthors, 2011: Explicit modelling of SOA formation from pinene photooxidation: Sensitivity to vapour pressure estimation. Atmospheric Chemistry and Physics, 11, 6895-6910, doi:10.5194/acp-11-6895-2011.

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Published Version: http://dx.doi.org/10.5194/acp-11-6895-2011

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